Sputtering Target

Zirconium Rotary Sputtering Targets

Zirconium Rotary Sputtering Targets Description Zirconium Rotary Sputtering Targets are made of high purity zirconium material after a series of processing, with a specific high purity zirconium

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Titanium Silicon Alloy Sputtering Target

Titanium Silicon Alloy Sputtering Target Description Sputtering target is an important part of operating magnetron sputtering technology, which can be divided into three types: metal, alloy and

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Boron Sputtering Target

Boron Sputtering Target Description The sputtering process is mainly to deposit a thin film of ultra-high-purity sputtered metal or oxide material onto another solid substrate, and control the

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99.95% Zirconium Sputter Targets

99.95% Zirconium Sputter Targets Description Magnetron sputtering is a new physical vapor coating method, which uses electron gun system to emit electrons and focus on the material to be plated, so

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Titanium Aluminum Alloy Sputtering Target

Titanium Aluminum Alloy Sputter Target Description Compared with ordinary melting process, Titanium Aluminum Alloy Sputter Target is generally produced by hot isostatic pressing process, which has

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High Purity Chromium Sputter Target

High Purity Chromium Sputter Target Description Chromium is a steel-grey, shiny, hard and brittle transition metal. High Purity Chromium Sputter Target is generally produced using vacuum melting or

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99.5% Boron Sputtering Targets

99.5% Boron Sputtering Targets Description The coating target is a sputtering source that forms various functional films on the substrate by sputtering under appropriate process conditions through

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Molybdenum (Mo) Sputtering Targets

Molybdenum (Mo) Sputtering Targets Description As a cutting-edge thin film material preparation technology, sputtering has two characteristics: "high speed" and "ultra-low

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High Purity Chromium Sputtering Target

High Purity Chromium Sputtering Target Description Chromium metal is highly valued for its high corrosion resistance and hardness, and by adding metallic chromium to stainless steel, it is possible

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Nickel Metal Sputtering Targets

Nickel Metal Sputtering Targets Description In industry, nickel is commonly used in alloy preparation, battery production, and as a catalyst. Especially in the field of target materials, nickel is

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Chromium Metal Sputter Targets

Chromium Metal Sputter Targets Description Chromium has a high melting point and good oxidation resistance, allowing the chromium target to remain stable in high temperature environments. In

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TiAl Titanium Alloy Sputtering Target

TiAl Titanium Alloy Sputtering Target Description Sputtering target refers to the raw material used in the sputtering deposition process. It refers to the process in which atoms are ejected from the

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We're well-known as one of the leading sputtering target manufacturers and suppliers in China. If you're going to wholesale high quality sputtering target with competitive price, welcome to get quotation from our factory. Also, customized service is available.

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