High Purity Chromium Sputter Target
High Purity Chromium Sputter Target Description
Chromium is a steel-grey, shiny, hard and brittle transition metal. High Purity Chromium Sputter Target is generally produced using vacuum melting or hot isostatic pressing processes. It has the characteristics of high melting point, corrosion resistance, high temperature resistance, impact resistance, wear resistance, high strength and hardness, and can be sputtered with high purity and adhesion. High-quality film with high properties, good uniformity, excellent corrosion resistance, wear resistance and durability. In the vacuum processing industry, High Purity Chromium Sputter Target can produce a relatively stable chromium ion beam, which allows it to be used to make substrates or surface coatings to protect substrates or to make some industries that particularly require high oxidation resistance. Component. High Purity Chromium Sputter Target is usually used in PVD and CVD processing processes to produce decorative coatings, corrosion-resistant coatings and reflective coatings. It can also plate chromium coatings of different colors by adjusting process parameters.
High Purity Chromium Sputter Target Specifications:
|
Grade |
CR009302,CR009500,CR009600,etc. |
|
Technique |
Hot isostatic pressing,Grain refinement,Sintering,Forging,Annealing |
|
Purity |
99.95%,99.9%,99.99%,99.999% |
|
Type |
Planar sputtering target,Rotary sputtering target,Acr cathode. |
|
Thickness |
3mm-40mm |
|
Length |
10mm-2000mm |
|
Diameter |
63mm,100mm,105mm,160mm |
|
Melting point |
1857°C |
|
Density |
7.2g/cm3 |
|
Shape |
Discs,Plates,Column Targets,Step Targets,Custom-made |
|
Surface |
Polishing,Alkali Cleaning,Grinding,Black Oxide, etc. |
|
Certification |
ISO9001,COA,MSDS |
High Purity Chromium Sputter Target Pictures:


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