Sputtering Target

Titanium Aluminum Alloy PVD Targets

Titanium Aluminum Alloy PVD Targets Description The coating target is a sputtering source that forms various functional films on the substrate by sputtering under appropriate process conditions

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Boron Round Sputter Target

Boron Round Sputter Target Description Boron Round Sputter Target is a material used for film preparation. It is made of boride materials through powder metallurgy (pressing metal powder under high

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Chromium Planar Sputtering Target

Chromium Planar Sputtering Target Features & Application The original chromium element needs to be purified by a series of processes such as high-temperature smelting, refining and electrolysis,

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99.95% Chromium Sputtering Target

99.95% Chromium Sputtering Target Features & Application 99.95% Chromium Sputtering Target is a high-purity metal target, which can be used to coat various materials with excellent chrome

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Chromium Sputtering Round Targets

Chromium Sputtering Round Targets Description Chromium metal is mainly used as a raw material for the production of various alloys. The industrial production of chromium metal mainly adopts two

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Titanium Chromium Alloy Round Targets

Titanium Chromium Alloy Round Targets can be used to make substrates or surface coatings, and can be used in the field of mechanical knives, automobile and motorcycle decoration, IT product shell and

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Titanium Chromium Planar Target

Titanium Chromium Planar Target is very suitable for sputtering corrosion-resistant and wear-resistant coatings, which can protect equipment working in highly corrosive chemical environments and

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Titanium Aluminum Sputter Targets

Titanium Aluminum Sputter Targets has the excellent characteristics of metal titanium and metal aluminum, such as high ductility, high wear resistance, excellent electrical and thermal conductivity,

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Titanium-Aluminum Targets

Titanium-Aluminum Targets can improve the hardness and service life of cutting tools, and are widely used in hardware tool coatings, decorative coatings, flat display coatings, PVD and CVD

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Titanium Ti Sputtering Target

Titanium Ti Sputtering Target is often used for sputtering deposition of pure titanium film or reactive sputtering deposition of TiN film, mainly used as a diffusion barrier layer interconnected with

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99.99% Pure Titanium Targets

99.99% Pure Titanium Targets not only have the advantages of high purity, good wear resistance, long service life and high coating quality, but also include all the excellent characteristics of

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Titanium-Silicon Sputtering Targets

Titanium-Silicon Sputtering Targets Description Titanium-Silicon Sputtering Targets can provide nitride hard material layers with excellent properties, because silicon guarantees high oxidation

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We're well-known as one of the leading sputtering target manufacturers and suppliers in China. If you're going to wholesale high quality sputtering target with competitive price, welcome to get quotation from our factory. Also, customized service is available.

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