Molybdenum (Mo) Sputtering Targets

Molybdenum (Mo) Sputtering Targets Description

As a cutting-edge thin film material preparation technology, sputtering has two characteristics: "high speed" and "ultra-low temperature". Molybdenum (Mo) Sputtering Targets are solids bombarded by high-speed ion flow during sputtering processing, which can sputter out films with high brightness, high color, durability, corrosion resistance, high adhesion and long service life. Molybdenum (Mo) Sputtering Targets are often made of pure molybdenum or molybdenum alloy materials through powder metallurgy or electron beam melting. They play an important role in the medical field and materials science, chemistry, physics and other fields.

Application of Molybdenum (Mo) Sputtering Targets:
1. Electronics industry: molybdenum target material is mainly used in flat display, thin film battery electrode and wiring materials and semiconductor device barrier layer raw materials.
2. Medical field: Mainly used in the medical field of X-ray generators, CT machines, MRI equipment, etc., for generating high-energy X-rays to help doctors diagnose and treat.
3. Aerospace field: The film sputtered by the target can be used to improve the surface performance and service life of important components.
4. Scientific research field: can help prepare chemical vapor deposition (CVD) film, microstructure material analysis.

Molybdenum (Mo) Sputtering Targets Specifications:

Molybdenum (Mo) Sputtering Targets Pictures:

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