Sputtering Target

YAG Sputtering Target

YAG Sputtering Target is a sputtering target composed of yttrium, aluminum, and garnet, usually made by powder metallurgy process, which can be widely used in vacuum coating, magnetron sputtering,

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Zirconium Target

Zirconium Target can be sputtered to produce a higher purity and more ornamental decorative coating, mainly used in household products, household appliances, photoelectric devices, semiconductor

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Chromium Target

Chromium Target is a sputtering target made of high-purity chromium material through powder metallurgy or smelting. It can sputter high-performance chromium films for wide application in mechanical

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Niobium Oxide Sputtering Plates

Niobium Oxide Sputtering Plates are targets made of high-quality niobium oxide materials, mainly used to produce highly transparent reflective films for use in optical lenses, automotive glass, solar

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High Purity Titanium Aluminum Alloy Target

High Purity Titanium Aluminum Alloy Target is often made of powder metallurgy process, with its excellent physical and chemical properties can be widely used in a variety of physical vapor deposition

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High Purity Copper Targets

High Purity Copper Targets are PVD process targets made from high-purity copper materials after powder metallurgy or melting process, mainly used in the semiconductor industry to deposit copper films

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Niobium Oxide Target

Niobium Oxide Target is generally made of niobium pentoxide material through powder metallurgy processing or magnetron sputtering technology. It has high density, high purity, minimum average grain

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Niobium Oxide Nb2O5 Sputtering Targets

Niobium Oxide Nb2O5 Sputtering Targets have a series of excellent properties such as high purity, high melting point, good high-temperature stability, strong corrosion resistance, excellent

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99.95% Chromium Cr Targets

99.95% Chromium Cr Targets are generally produced by vacuum melting or hot isostatic pressing process, which can sputter high-quality films with high purity, high adhesion, good uniformity, excellent

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Titanium Aluminium TiAl Target

Titanium Aluminium TiAl Target Description Titanium Aluminium TiAl Target is a target material composed of two elements, titanium and aluminum. It is mainly used in the manufacture of integrated

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99.9% Boron Metal Target

99.9% Boron Metal Target Description 99.9% Boron Metal Target is a kind of high-purity, high-density semiconductor target material, which is mainly made through powder smelting, pressing,

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X-Ray Tube Tungsten Targets

X-Ray Tube Tungsten Targets Description X-Ray Tube Tungsten Targets are primarily made of tungsten sheet material and are manufactured using electrospark cutting or punching techniques. They have

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