Titanium Silicon Alloy Sputtering Target

Titanium Silicon Alloy Sputtering Target Description

Sputtering target is an important part of operating magnetron sputtering technology, which can be divided into three types: metal, alloy and ceramic. Among them, the higher the purity of the material, the higher the quality of the sputtered coating film, the better the wear resistance, and the longer the protection effect on the tool. Titanium Silicon Alloy Sputtering Target is made of high-quality titanium-silicon mixed powder through powder metallurgy technology after a series of processing such as pressing, sintering, rolling, annealing, grinding and polishing, with high purity, stable structure and good coating quality High and strong adhesion, strong corrosion resistance, good wear resistance, excellent impact resistance and strong durability and other excellent characteristics. Titanium Silicon Alloy Sputtering Targets are very suitable for working in harsh environments, often used in PVD or CVD coating systems, very suitable for decorative coating industry, semiconductor device coating, hardware tool coating, automotive glass coating, vacuum coating , the medical industry, LED and photovoltaic devices and other fields.

Titanium Silicon Alloy Sputtering Target Specifications:

Titanium Silicon Alloy Sputtering Target Pictures:

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