Chromium Metal Sputter Targets
Chromium Metal Sputter Targets Description
Chromium has a high melting point and good oxidation resistance, allowing the chromium target to remain stable in high temperature environments. In addition, the electron beam deposition and magnetron sputtering characteristics of chromium targets give it unique advantages in high-tech fields such as microelectronics processing and optical coatings. Chromium Metal Sputter Targets are the core material for preparing high-tech thin films. They are often made by vacuum smelting, powder metallurgy and electrochemical deposition. They can produce products with high purity, high adhesion, good uniformity and corrosion resistance. A high-quality film with excellent, wear-resistant and durable properties. Chromium Metal Sputter Targets can be widely used in high-end electronics industry, microelectronic devices, optical coating industry, PVD technology, solar energy and lighting industry, aerospace industry and vacuum coating industry, etc.
Chromium Metal Sputter Targets Specifications:
|
Grade |
CR009302,CR009500,CR009600,etc. |
|
Technique |
Hot isostatic pressing,Grain refinement,Sintering,Forging,Annealing |
|
Purity |
99.95%,99.9%,99.99%,99.999% |
|
Type |
Planar sputtering target,Rotary sputtering target,Acr cathode. |
|
Thickness |
3mm-40mm |
|
Length |
10mm-2000mm |
|
Diameter |
63mm,100mm,105mm,160mm |
|
Melting point |
1857°C |
|
Density |
7.2g/cm3 |
|
Surface |
Polishing |
|
Certification |
ISO9001 |
Chromium Metal Sputter Targets Pictures:
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