TiAl Titanium Alloy Sputtering Target

TiAl Titanium Alloy Sputtering Target Description

Sputtering target refers to the raw material used in the sputtering deposition process. It refers to the process in which atoms are ejected from the solid target due to high-energy particle bombardment of the target. Its main function is to deposit a thin film on the object. . TiAl Titanium Alloy Sputtering Target is often made by vacuum smelting manufacturing method. It has a series of excellent properties of titanium and zirconium, such as high hardness, high temperature resistance, high mechanical strength, good biophilicity, excellent corrosion resistance, strong arc impact resistance, and Grinding, durable, etc. TiAl Titanium Alloy Sputtering Target can be widely used in vacuum coating technology using PVD and CVD as the main processes. It can coat electronic products, electronic devices, shielded display devices and integrated circuit devices to improve the viewing quality and service life. It can also be used to coat processing tools, molds and glass to meet the needs of the global manufacturing industry for high-performance tools and energy-saving and environmentally friendly glass.

TiAl Titanium Alloy Sputtering Target Specifications:

TiAl Titanium Alloy Sputtering Target Picture

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