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Nickel Metal Sputtering Targets
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Nickel Metal Sputtering Targets

Nickel Metal Sputtering Targets

Nickel Metal Sputtering Targets Description In industry, nickel is commonly used in alloy preparation, battery production, and as a catalyst. Especially in the field of target materials, nickel is widely used due to its excellent physical and chemical properties. Nickel Metal Sputtering Targets...
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Product Details ofNickel Metal Sputtering Targets

Nickel Metal Sputtering Targets Description

In industry, nickel is commonly used in alloy preparation, battery production, and as a catalyst. Especially in the field of target materials, nickel is widely used due to its excellent physical and chemical properties. Nickel Metal Sputtering Targets are mainly made of high-purity nickel materials through sputtering, electron beam evaporation, hot pressing or chemical vapor deposition technology. They can be selected and combined according to the actual needs of customers. Nickel Metal Sputtering Targets have good processing properties, strong corrosion resistance, good thermal and electrical conductivity, specific electrical and magnetic properties, uniform microstructure, impact resistance, wear resistance, long service life, etc. Excellent characteristics, it is suitable for wide application in data storage industry, electronics, semiconductor industry, optical communication, flat display industry, glass coating (automobile, furniture and construction) and other fields.

Nickel Metal Sputtering Targets Specifications:

Grade

Nickel 200,201

Technique

Hot isostatic pressing,Grain refinement,Sintering,Forging,Annealing

Purity

99.999%

Outer diameter

Φ101.6-3.175mm

Density

8.9g/cm3

Shape

Round

Surface

Polishing

Delivery Time

25 days

Standard

ASTM B161,ASTM B622

Certification

ISO9001

Nickel Metal Sputtering Targets Pictures:

Nickel Sputtering Target

Nickel Target

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