Nickel Metal Sputtering Targets
Nickel Metal Sputtering Targets Description
In industry, nickel is commonly used in alloy preparation, battery production, and as a catalyst. Especially in the field of target materials, nickel is widely used due to its excellent physical and chemical properties. Nickel Metal Sputtering Targets are mainly made of high-purity nickel materials through sputtering, electron beam evaporation, hot pressing or chemical vapor deposition technology. They can be selected and combined according to the actual needs of customers. Nickel Metal Sputtering Targets have good processing properties, strong corrosion resistance, good thermal and electrical conductivity, specific electrical and magnetic properties, uniform microstructure, impact resistance, wear resistance, long service life, etc. Excellent characteristics, it is suitable for wide application in data storage industry, electronics, semiconductor industry, optical communication, flat display industry, glass coating (automobile, furniture and construction) and other fields.
Nickel Metal Sputtering Targets Specifications:
|
Grade |
Nickel 200,201 |
|
Technique |
Hot isostatic pressing,Grain refinement,Sintering,Forging,Annealing |
|
Purity |
99.999% |
|
Outer diameter |
Φ101.6-3.175mm |
|
Density |
8.9g/cm3 |
|
Shape |
Round |
|
Surface |
Polishing |
|
Delivery Time |
25 days |
|
Standard |
ASTM B161,ASTM B622 |
|
Certification |
ISO9001 |
Nickel Metal Sputtering Targets Pictures:


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