Zirconium Rotary Sputtering Targets

Zirconium Rotary Sputtering Targets Description

Zirconium Rotary Sputtering Targets are made of high purity zirconium material after a series of processing, with a specific high purity zirconium material size and shape, the use process is: The target material is first placed in a vacuum chamber, and then bombarded with high-energy ions or electrons, so that atoms or molecules are ejected from the target surface and deposited on the substrate surface. Zirconium Rotary Sputtering Targets have the characteristics of high purity, good processing performance, fast coating speed and high quality, corrosion resistance, high temperature resistance, wear resistance, long service life, etc. It can provide very good corrosion resistance and high temperature and low temperature coating protection for the important parts in the chemical industry or aerospace industry. It can also be used in large area glass coating industry and electronic engineering industry.

In order to extend the service life of zirconium targets, the key is to ensure the appropriate conditions during storage and use. During storage, the target should be kept in a dry, temperature-stable environment to avoid oxidation or structural damage due to humidity and temperature fluctuations. During use, it is important to ensure that the target is evenly worn to avoid local excessive consumption. This includes regular inspection of the target for wear and structural integrity, as well as appropriate adjustment measures.

Zirconium Rotary Sputtering Targets Specifications:

Zirconium Rotary Sputtering Targets Picture：

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