High Purity Copper Targets

High Purity Copper Targets are PVD process targets made from high-purity copper materials after powder metallurgy or melting process, mainly used in the semiconductor industry to deposit copper films on integrated circuits, and can also be used as back contact materials to establish connections between solar cells and external circuits. High Purity Copper Targets are also used to produce high-quality decorative coatings on a variety of materials such as glass, plastics, and ceramics to meet customer requirements for gloss and corrosion resistance of applied products.

High Purity Copper Targets Advantage

1. The high purity of the target determines the high quality, good uniformity, and no impurities of the deposited film

2. Good thermal conductivity, heat dissipation, and high temperature resistance

3. High density, can withstand high power density without melting or degradation

4. Easy to process and shape into various forms, including disks, rectangles, and rotating targets

5. It can be used as backplane material to provide stable support for sputtering targets, improve sputtering efficiency, and target service life

High Purity Copper Targets Dimension

High Purity Copper Targets Pictures

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