Niobium Oxide Nb2O5 Sputtering Targets
Niobium Oxide Nb2O5 Sputtering Targets Description
Niobium pentoxide is a white insoluble compound with high dielectric constant and good chemical stability. It is commonly used in capacitors, optical coatings, and catalyst carriers. Niobium Oxide Nb2O5 Sputtering Targets are made of high-purity niobium oxide materials by hot pressing or magnetron sputtering. They can produce high-performance, high-uniformity, and high-adhesion niobium oxide films for use in high-end optoelectronic devices and precision instruments.
Niobium Oxide Nb2O5 Sputtering Targets have a series of excellent properties such as high purity, high melting point, good high-temperature stability, strong corrosion resistance, excellent electrical insulation, high dielectric constant, excellent optoelectronic properties, wear resistance, long service life, etc. They are mainly used in semiconductors, solar energy, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays, nanotechnology, and optical applications.
Niobium Oxide Nb2O5 Sputtering Targets Specifications:
|
Material |
Nb2O5 |
|
Appearance |
Crystalline Solid, Grey-Black |
|
Purity |
Nb≥99.95% |
|
Density |
4.47g/cm3 |
|
Size |
450 x 300 x 12mm |
|
Thickness |
1-20mm |
|
Melting Point |
1512 °C (2754 °F) |
|
Surface |
Mill finish, polished,Black, Pickled,Electro-polished, Bright |
|
Shape |
Plates, Step Targets |
|
Certification |
ISO9001 |
Niobium Oxide Nb2O5 Sputtering Targets Pictures


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