High Purity Titanium Aluminum Alloy Target

High Purity Titanium Aluminum Alloy Target Description

Our company generally uses powder metallurgy process to manufacture alloy targets. The finished product has the characteristics of high density, no porosity, no porosity and segregation, uniform composition, fine grain and so on. The role of the target is to deposit a film with a specific function or decorative effect on the substrate through magnetron sputtering or physical vapor deposition (PVD) technology.

High Purity Titanium Aluminum Alloy Target contains a range of excellent properties of titanium alloys：

1. High purity and high density, more uniform and high-quality coating can be obtained in the vacuum coating process

2. High tensile strength, good wear resistance, corrosion resistance and oxidation resistance, which can provide the service life of the target and film

3. Good electrical and thermal conductivity, high temperature stability

4. High coating efficiency and high quality

The High Purity Titanium Aluminum Alloy Target produced by our company is widely used in decorative coating and tool coating, which can effectively improve the service life and efficiency of tools. In semiconductor manufacturing, they are often used to manufacture the interface layer, welding aid film, barrier layer, etc., in semiconductor equipment, and are mainly used as metal sputtering in wafer manufacturing, often using the PVD process for coating. Decorative coatings are mainly used in jewelry, instruments, glasses frames, home decoration and other fields.

High Purity Titanium Aluminum Alloy Target Specifications:

High Purity Titanium Aluminum Alloy Target Picture

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