Chromium Target
Overview
A Chromium Target is a key consumable used to produce chromium thin films in thin film deposition technologies, such as magnetron sputtering and electron beam evaporation. It is primarily made from high-purity metallic chromium and is manufactured through processes like powder metallurgy, melting, and pressing. It has a wide range of applications, including in semiconductor manufacturing (e.g., Cu interconnect barrier layers and photolithography mask light-shielding layers), optical components (e.g., infrared reflectors and decorative chrome plating), mechanical wear-resistant coatings (e.g., bearings and mold surface protection), high-temperature resistant coatings in aerospace, and anti-corrosion coatings in the chemical industry, among others.
99.95% Chromium Target Characteristics
Excellent physical properties
The Mohs hardness of chromium is about 9, second only to diamond and a few superhard materials. The hardness of chromium film deposited by sputtering can reach 600-1200HV. The thermal expansion coefficient of chromium is highly matched with that of metal, ceramic, glass, and other substrates.
Outstanding chemical stability
Chromium easily forms a dense Cr2O2 passivation film in the air, which has strong corrosion resistance to acids (such as sulfuric acid, hydrochloric acid), alkalis, and salt solutions. For example, the anti-corrosion coating of metal parts of ship hulls and aircraft skins can resist erosion from salt spray and humid environments.
Good optical and electrical properties
The reflectivity of chromium in the visible light band is about 60%-70%, and in the infrared band it can reach over 90%. In particular, its contact resistance with silicon components in semiconductors is low, making it suitable for conductivity.
Ideal materials for sputtering deposition
It has high purity and sputtering efficiency higher than most refractory metals (such as tungsten and molybdenum), and has a stable deposition rate. It can prepare uniform thin films on large-area substrates and is suitable for large-scale production (such as display panels and solar cells).
Dimension
|
Grade |
CR009302,CR009500,CR009600,etc. |
|
Purity |
99.95%,99.9%,99.99%,99.999% |
|
Thickness |
3mm-40mm |
|
Diameter |
50mm-160mm |
|
Melting point |
1857°C |
|
Density |
7.2g/cm3 |
|
Shape |
Discs |
|
Surface |
Polishing, Alkali Cleaning |
|
Certification |
ISO9001 |
Application
1. The semiconductor industry
Chromium films are often used as thin-film deposition materials. Their high heat resistance and excellent chemical stability significantly enhance the overall performance and durability of semiconductor devices.
2. Photovoltaic industry
Chromium target materials can be used to manufacture solar panels. By enhancing the light absorption rate of the battery and reducing the surface reflectivity, they can increase the solar energy conversion efficiency, thereby boosting the power generation capacity of solar panels and lowering energy costs.
3. Decorative and protective coatings for automobiles and buildings
Used for the production of decorative metal films. These chromium films not only offer an attractive luster and color but also provide additional anti-corrosion and wear-resistant protection, enhancing the appearance and durability of the products.
4. Physical deposition films and functional coatings for electronic components, displays, and tools (PVD method).
5. Vacuum chromium plating is used for watch parts, household appliance components, hydraulic cylinders, slide valves, colored glass, and other machinery and equipment.
Application of Chromium Sputtering Targets in Semiconductor Manufacturing
- Mainly used in the sputtering coating process, it can form a uniform, dense, and strong adhesion chromium film, which can significantly improve the performance and stability of semiconductor devices.
- Chromium Cr Targets are widely used in deposition films of integrated circuits and are used for conductive paths and connections in microelectronic devices, ensuring efficient heat dissipation and stable transmission of conductive layers.
- Chromium Cr Round Target is also used in the anti-etching layer, which can protect the circuit structure from damage during the etching process and improve the integrity of the circuit pattern
- In certain specific semiconductor devices, such as optical sensors and solar cells, high-quality films sputtered by Chromium Targets can further optimize the optical performance and service life of the device.
Process
- Powder metallurgy: low cost, suitable for preparing large-sized and special-shaped targets (such as curved targets)
① After purifying the chromium powder, mix it with a small amount of sintering aids and homogenize the powder particles through ball milling.
② Make a blank through cold isostatic pressing or hot isostatic pressing to increase the density of the target.
③ Sinter in a hydrogen protective atmosphere furnace for 2-4 hours to eliminate pores through diffusion sintering and increase the density of the material.
④ Cut and grind the sintered blank to reduce the dimensional tolerance, and polish the surface after ultrasonic cleaning to remove the surface oxide layer.
- Melting method: high density, higher purity, but complex process, high cost, mostly used for round or rectangular standard targets.
① Use electron beam melting or vacuum arc melting to melt high-purity chromium blocks.
② Cast the molten chromium liquid into ingots and then hot forge or hot roll.
③ Cut the forged chromium ingots into customized sizes, remove the oxide scale by mechanical grinding, and then anneal.
④ Carry out comprehensive quality inspection before packaging and shipment, such as appearance inspection, dimensional accuracy, strength test, etc.
Pictures
Video
Why choose us
One-stop Solution
After receiving the customer's inquiry, we will provide timely feedback and provide a series of services including product quotation, customized production, quality inspection certificate, packaging and delivery, and product after-sales service. You can order with confidence.
Competitive prices
Our product prices are lower than other suppliers in Europe and America, and the product quality is not inferior. We can also accept minimum order quantities.
Professional equipment
We have a professional technical team and are equipped with advanced production equipment such as vacuum furnaces, CNC machine tools, rolling mills, etc. You can trust our product quality and processing technology.
High-Quality After-Sales
If you have any questions after receiving the product, please feel free to contact us. We will provide the best after-sales solution for customers based on the actual situation, and we can also give you a discount on your next order.
Case
Chromium Target, 99.95% Chromium Cr Targets To Korea
In early January, we signed a target-related trade cooperation agreement with a Korean customer. Customers have ordered a certain amount of 99.95% Chromium Cr Targets from us to be used in their electronic equipment production. We reached a consensus with the customer on size, product quantity, price, and delivery time through email.
We use a powder metallurgy process according to the customer's requirements in processing. Powder metallurgy is a method of pressing high-purity chromium powder into a shape and then sintering it. It is suitable for preparing targets with complex shapes. To obtain targets with high purity, dense microstructure, and high surface finish, surface treatment processes such as pickling and polishing are required. Finally, quality and performance tests must be carried out to meet international standards.
Product Qualification
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