YAG Sputtering Target
YAG Sputtering Target Description
Material selection and processing
YAG Targets is the full name of Yttrium Aluminum Garnet Target, which is mainly composed of metal elements such as yttrium, aluminum and garnet. Generally, there are production processes such as raw material purification (chemical or physical method), target material preparation, surface treatment and quality control. Purity plays a key role in the high-precision application of target materials. The preparation methods mainly include powder metallurgy process and casting process. Surface treatment includes machining, surface cleaning and surface roughness control. Finally, the quality of the target material is verified by purity detection, microstructure analysis and mechanical property testing.
Characteristics
- High strength, high hardness, wear resistance, long service life
- Unique high transmittance, high refractive index, important in lasers and optical instruments
- High thermal conductivity, high melting point, good high temperature stability
- Corrosion resistance, maintains excellent performance in various corrosive media
- High purity, strong anti-ballistic performance
Application
Yttrium Aluminum Garnet Sputtering Target is widely used in evaporation, coating and sputtering processes, especially in the field of magnetron sputtering and vacuum coating. It is often used in scientific research, industrial production and electronic product manufacturing, such as LED manufacturing, optical devices and electronic device coating.
- Laser technology: commonly used in the manufacture of lasers, especially in diode-pumped laser systems, because of its wide absorption bandwidth and low heat load characteristics.
- Optical equipment and window materials: YAG targets have high optical uniformity and stable mechanochemical properties, and are suitable for optical window materials in high temperature and high energy fields.
- New energy field: can be used to prepare the front electrode of solar cells, improve the photoelectric conversion efficiency and battery quality
- Semiconductor field: can be used to manufacture key components such as interconnects and capacitors in integrated circuit chips
YAG Sputtering Target Specifications
|
Grade |
Y3Al5O12 |
|
Purity |
99.9%-99.999% |
|
Mohs Hardness |
8.5 |
|
Diameter |
50mm-160mm or customized |
|
Melting point |
1970°C |
|
Density |
4.56g/cm3 |
|
Shape |
Discs |
|
Delivery Time |
15-20 days |
|
Certification |
ISO9001 |
YAG Sputtering Target Pictures
Our ordering process
Customer Inquiry
Customers can ask us for the price of related products by email or other contact methods. After receiving the email, we will communicate with customers about the product details, including materials, processing technology, size specifications, etc. Of course, we can also accept customized services based on customers' drawings.
01
Company Quotes
We will give customers a quotation (including freight) based on product specifications, processing requirements, delivery time and order quantity. After the customer confirms the order, we will send an electronic invoice for the customer to pay, and we will start production immediately after receiving the payment.
02
Put into production
Hand over and schedule with workers and factories to ensure that orders are completed within the delivery period. Our company has a series of advanced production equipment and has also obtained ISO certification, so you can order with confidence.
03
Packing and delivery
After the product is produced and passes quality inspection, we use shock-proof foam boards and sturdy wooden boxes for packaging, and then ship it overseas via UPS or FedEx to ensure that customers receive the product intact.
04
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