Titanium Aluminum Alloy PVD Targets

Titanium Aluminum Alloy PVD Targets Description

The coating target is a sputtering source that forms various functional films on the substrate by sputtering under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating systems. To put it simply, the target material is the target material bombarded by high-speed charged particles. Titanium Aluminum Alloy PVD Targets have better mechanical strength, better corrosion resistance, better biocompatibility, higher fatigue resistance, high coating performance, long service life and impact resistance than other metal targets. Better to wait. Titanium Aluminum Alloy PVD Targets are often made by smelting casting method and powder sintering method, and can be widely used in many vacuum coating fields such as decoration, mold processing, glass, electronic devices, semiconductors, magnetic recording, flat display, solar cells, etc. Our company can provide flat targets (rectangular targets and arc targets) and tubular targets. If necessary, please feel free to contact us by email.

Titanium Aluminum Alloy PVD Targets Specifications:

Titanium Aluminum Alloy PVD Targets Picture

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