Titanium-Aluminum Targets
Titanium-Aluminum Targets Description
Aluminum has the characteristics of easy deposition, high electrical conductivity, good thermal conductivity, adhesion to the substrate and low cost, while titanium has good corrosion resistance and non-magnetic properties, so Titanium-Aluminum Targets composed of the two are Key consumables used in high-tech industries or electronic engineering in sputtering processing. Titanium-Aluminum Targets can improve the hardness and service life of cutting tools, and are widely used in hardware tool coatings, decorative coatings, flat display coatings, PVD and CVD processing, semiconductor components, and various magnetron sputtering machines and ion Plating machine.
Titanium-Aluminum Targets can be produced by electron beam melting and vacuum consumable electric arc furnace melting. During the processing, not only the material purity, density and grain size must be strictly controlled, but also the heat treatment and forming process should be paid attention to. environmental conditions.
Titanium-Aluminum Targets Specifications:
|
Grade |
TiAl25/75,30/70,40/60 |
|
Technique |
Hot isostatic pressing,Smelting,Sintering,Forging,Annealing |
|
Purity |
99.5-99.9% |
|
Thickness |
3mm-30mm |
|
Length |
10mm-2000mm |
|
Diameter |
<500 mm |
|
Density |
3.4g/cm3 |
|
Shape |
Discs,Plates,Column Targets,Step Targets,Custom-made |
|
Surface |
Polished,Alkali Cleaning,Grinding,Black Oxide, etc. |
|
Delivery Time |
20-30 days |
|
Certification |
ISO9001 |
Titanium-Aluminum Targets Pictures:]
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