Metal Sputtering Target

99.99% Nickel Round Target

99.99% Nickel Round Target Description Sputtering target refers to the raw material used in the sputtering deposition process. It refers to the process in which atoms are ejected from the solid

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Pure Nickel Metal Target

Pure Nickel Metal Target Description Nickel is a silver-white metal with magnetic properties and good plasticity, mainly used in alloys (such as nickel steel and nickel silver) and as a hydrogenation

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Nickel Ni Sputtering Target

Nickel Ni Sputtering Target Features & Application Nickel is a silver-white metallic element with good ductility, toughness and high melting point. In industry, nickel is commonly used in alloy

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99.99% Nickel Sputtering Targets

99.99% Nickel Sputtering Targets Description The target material is the material used as the source of sputtering or evaporation in the process of physical vapor deposition (PVD) or chemical vapor

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High Purity 4N Nickel Sputter Target

High Purity 4N Nickel Sputter Target Description High Purity 4N Nickel Sputter Target is made of high-purity nickel material after powder metallurgy and forging polishing. It can be prepared by

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Chromium Rotary Sputter Target

Chromium Rotary Sputter Target Description Chromium has good oxidation resistance and corrosion resistance, and can form a stable oxide film in the natural environment to protect the metal from

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Zirconium 702 Round Sputtering Target

Zirconium 702 Round Sputtering Target Description Thin film deposition (coating) is the process of forming and depositing thin film coatings on substrate materials that can be used to change or

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Zirconium Rotary Sputtering Targets

Zirconium Rotary Sputtering Targets Description Zirconium Rotary Sputtering Targets are made of high purity zirconium material after a series of processing, with a specific high purity zirconium

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Titanium Silicon Alloy Sputtering Target

Titanium Silicon Alloy Sputtering Target Description Sputtering target is an important part of operating magnetron sputtering technology, which can be divided into three types: metal, alloy and

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Boron Sputtering Target

Boron Sputtering Target Description The sputtering process is mainly to deposit a thin film of ultra-high-purity sputtered metal or oxide material onto another solid substrate, and control the

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99.95% Zirconium Sputter Targets

99.95% Zirconium Sputter Targets Description Magnetron sputtering is a new physical vapor coating method, which uses electron gun system to emit electrons and focus on the material to be plated, so

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Titanium Aluminum Alloy Sputtering Target

Titanium Aluminum Alloy Sputter Target Description Compared with ordinary melting process, Titanium Aluminum Alloy Sputter Target is generally produced by hot isostatic pressing process, which has

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We're well-known as one of the leading metal sputtering target manufacturers and suppliers in China. If you're going to wholesale high quality metal sputtering target with competitive price, welcome to get quotation from our factory. Also, customized service is available.

Aluminum Silicon Sputtering Target, Silicon Aluminum Sputtering Target, Chromium Cr Round Target

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