Zirconium 702 Round Sputtering Target

Zirconium 702 Round Sputtering Target Description

Thin film deposition (coating) is the process of forming and depositing thin film coatings on substrate materials that can be used to change or improve certain elements of the substrate's properties. It is an important manufacturing step in the production of many optoelectronic, solid-state and medical devices and products. Zirconium 702 Round Sputtering Target is the most commonly used target target in the coating process. It can coat the substrate with wear-resistant coating, reflective coating, conductive coating, corrosion-resistant coating or decorative coating. The higher the purity of the material, the greater the adhesion, wear resistance and service life of the coating, and the stronger the protective effect on the product. Zirconium 702 Round Sputtering Target has the advantages of low density, high specific strength, corrosion resistance, high temperature resistance, wear resistance, excellent processing performance, non-toxic, non-magnetic, small thermal neutron absorption cross-section, long service life, etc., and can be widely used Suitable for coating processing of electronic products, fiber lasers, LED displays, microscopes, semiconductor lasers and other precision instruments. If necessary, please feel free to contact us by email.

Zirconium 702 Round Sputtering Target Specifications:

Zirconium 702 Round Sputtering Target Pictures

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