99.99% Nickel Round Target

99.99% Nickel Round Target Description

Sputtering target refers to the raw material used in the sputtering deposition process. It refers to the process in which atoms are ejected from the solid target due to high-energy particle bombardment of the target. Its main function is to deposit a thin film on the workpiece. . 99.99% Nickel Round Target is mainly made of high-purity nickel metal, which has undergone processes such as electron beam melting, forging, rolling, annealing and inspection, and through repeated plastic processing, it can provide good sputtering rate and uniform adhesion. High film layer. 99.99% Nickel Round Target has the characteristics of etc. It is often used in the coating process of workpieces. Its produced parts can be widely used in the data storage industry, electronics and semiconductor industry, optical communications, magnetic capacitors, chemical industry, glass coating, automobile manufacturing, Construction industry, etc.

99.99% Nickel Round Target Specifications:

99.99% Nickel Round Target Pictures

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