Molybdenum Sputtering Target

Molybdenum Sputtering Target Description

Molybdenum Sputtering Target is a very environmentally friendly sputtering material. Its purity is generally above 99.95%. It has high strength, good electrical and thermal conductivity, low thermal expansion coefficient, uniform internal structure, good corrosion resistance and durability. Strong and other excellent characteristics. The surface of Molybdenum Sputtering Targets can be said to be bright, polished and rolled, and the shape can be round, rectangular and tubular. Molybdenum Sputtering Targets are often used in vacuum coating industry, aerospace industry, marine automotive industry, instrumentation industry, and photovoltaic industry.

What is a Sputtering Target?

Sputtering Targets developed in the 20th century as a thin film deposition technique, an ancient process of physical vapor deposition mechanism, but also has many uses in modern technology and manufacturing. The process begins by placing the substrate (or other item to be coated) into a vacuum chamber containing two magnets. After a controlled gas, such as argon, is introduced into the chamber, the atoms are pulled from the substrate with a magnet. These atoms then collide with each other in a gaseous state, condense into a plasma, and dry into a thin film on a substrate, eventually forming a thin, durable coating suitable for coating on a variety of devices. The chemical purity of the metal is the key to the manufacture of sputtering targets. The higher the purity, the better the performance of the deposited film.

Molybdenum Sputtering Target Specifications:

Molybdenum Sputtering Target Pictures:

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