High Purity Titanium Targets
High Purity Titanium Targets Description
Titanium is a paramagnetic refractory metal with strong toughness and high strength, especially in an oxygen-free environment. For targets, the higher the chemical purity of the metal, the better the conductivity of the film made from it. High Purity Titanium Targets are often made using powder metallurgy technology. It has excellent properties such as high purity, high strength and hardness, high specific strength, corrosion resistance, impact resistance, good high temperature stability, wear resistance, durability and high coating quality. High Purity Titanium Targets are used for metal evaporation and deposition in various physical vapor deposition and sputtering processes. It can be well used in optical coatings, vacuum coatings, optoelectronic devices, high-temperature processing tools, chemical catalysts and medical equipment. For example, in the semiconductor industry, Titanium Target can be used to manufacture electronic components such as photodiodes, transistors, receivers or transmitters.
High Purity Titanium Targets Specification:
|
Material |
Gr1-4 |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Purity |
99.9%-99.995% |
|
Diameter |
10-1000mm |
|
Thickness |
1-100mm |
|
Density |
4.5g/cm3 |
|
Surface |
Polished |
|
Shape |
Disc,Plate,Rectangular,Square,Column Targets, |
|
Standard |
ASTM B348,GB,JIS |
|
Certification |
ISO9001,ISO14001 |
High Purity Titanium Targets Picture:


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