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High Purity Titanium Targets
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High Purity Titanium Targets

High Purity Titanium Targets

High Purity Titanium Targets Description Titanium is a paramagnetic refractory metal with strong toughness and high strength, especially in an oxygen-free environment. For targets, the higher the chemical purity of the metal, the better the conductivity of the film made from it. High Purity...
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Product Details ofHigh Purity Titanium Targets

High Purity Titanium Targets Description

Titanium is a paramagnetic refractory metal with strong toughness and high strength, especially in an oxygen-free environment. For targets, the higher the chemical purity of the metal, the better the conductivity of the film made from it. High Purity Titanium Targets are often made using powder metallurgy technology. It has excellent properties such as high purity, high strength and hardness, high specific strength, corrosion resistance, impact resistance, good high temperature stability, wear resistance, durability and high coating quality. High Purity Titanium Targets are used for metal evaporation and deposition in various physical vapor deposition and sputtering processes. It can be well used in optical coatings, vacuum coatings, optoelectronic devices, high-temperature processing tools, chemical catalysts and medical equipment. For example, in the semiconductor industry, Titanium Target can be used to manufacture electronic components such as photodiodes, transistors, receivers or transmitters.

High Purity Titanium Targets Specification:

Material

Gr1-4

Technique

Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining

Purity

99.9%-99.995%

Diameter

10-1000mm

Thickness

1-100mm

Density

4.5g/cm3

Surface

Polished

Shape

Disc,Plate,Rectangular,Square,Column Targets,

Standard

ASTM B348,GB,JIS

Certification

ISO9001,ISO14001

High Purity Titanium Targets Picture:

Titanium Targets

Titanium Ti Sputtering Target

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