Sputtering Target

High Purity Molybdenum Rotary Target

High Purity Molybdenum Rotary Target Molybdenum Rotary Target come in many forms, purities, sizes and prices. Rotary molybdenum target is a series of processed products of high-purity molybdenum

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High Purity Mo Sputter Target

High Purity Mo Sputter Target The company produces high-purity metal box High Purity Mo Sputter Target with independent intellectual property rights, which have been used in magnetron sputtering

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Mo Sputtering Targets

Mo Sputtering Targets Model does not. :Mo Sputtering Targets Standard: ASTM, GB Surface: Polished, Cynomolgus Application: Surface Coating Purity: 99.95% minimum Density: 10.2 g/cm3 Application:

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Molybdenum Sputtering Target

Molybdenum Sputtering Target Description Molybdenum Sputtering Target is a very environmentally friendly sputtering material. Its purity is generally above 99.95%. It has high strength, good

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Molybdenum Round Target

Molybdenum Round Target Description & Application Molybdenum Round Target is mainly composed of target blank, back plate and other parts. The two require different welding processes for joining. The

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Copper Sputtering Target

Copper Sputtering Target Description & Application Sputtering targets are a special class of materials that are mainly used in the thin film coating and vacuum coating industries. Copper Sputtering

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Tungsten Round Target

Tungsten Round Target Feature & Application Tungsten Round Target is a typical product of tungsten products in the electronics industry. It is mainly made of high-purity tungsten material after cold

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Tungsten Round Sputtering Target

Tungsten Round Sputtering Target Description & Application The target is one of the indispensable materials for magnetron sputtering technology, and the performance of the target more or less

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Chromium Sputter Coater Target

Chromium Sputter Coater Target Description Chromium Sputter Coater Target has the same properties as metallic chromium, mainly high strength, high hardness, high oxidation resistance and corrosion

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Chromium Cr Sputtering Targets

Chromium Cr Sputtering Targets Description & Application Chrome metal is silver, glossy, highly mirror-polished and very hard, and is mainly used to make alloys. Chromium Cr Sputtering Targets

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ASTMB865 Nickel Target

ASTMB865 Nickel Target Description Nickel targets are mainly made of high-purity nickel metal, which has undergone processing processes such as electron beam melting, forging, rolling, annealing and

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High Purity Titanium Sputtering Target

High Purity Titanium Sputtering Target Description & Application Titanium is a paramagnetic refractory metal with strong toughness and high strength especially in an oxygen-free environment. For

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We're well-known as one of the leading sputtering target manufacturers and suppliers in China. If you're going to wholesale high quality sputtering target with competitive price, welcome to get quotation from our factory. Also, customized service is available.

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