High Purity Zirconium Planar Sputtering Target
High Purity Zirconium Planar Sputtering Target Introduction
Zirconium is a silver-gray metal with excellent corrosion resistance. It can form a dense oxide film on the surface, which makes it very suitable for making sputtering targets to improve the corrosion resistance and durability of tools. High Purity Zirconium Planar Sputtering Target is generally made of high-quality zirconium material, which has the advantages of accurate size, high purity, fine grain size, uniform microstructure, good surface condition, high coating quality and long working time. High Purity Zirconium Planar Sputtering Target is generally grade 702, and its main function is to coat processing tools with excellent performance for long-term work in high-strength environments, so as to prolong the service life of tools and improve the output quality of processed workpieces , High Purity Zirconium Planar Sputtering Target has the best process stability and performance, often used in semiconductors, physical vapor deposition (PVD) display, optical industry, glass coating, electronic engineering and medical industries.
High Purity Zirconium Planar Sputtering Target Specifications:
|
Material |
Zr702 |
|
Purity |
99.2% |
|
Density |
6.50g/cm3 |
|
Processes |
Hot isostatic pressing,Sintering,Vacuum Melting,Forging,Machining |
|
Width |
up to 500mm |
|
Length |
100mm-3000mm |
|
Thickness |
1.0 – 50mm |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Rectangle |
|
Standard |
ASTM B550,ASTM B551,GB |
|
Deliver time |
About 20 days |
|
Certification |
ISO9001 |
High Purity Zirconium Planar Sputtering Target Pictures:


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