Titanium Aluminum Sputtering Target
FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.
Titanium Aluminum Sputtering Target Picture:
Titanium Aluminum Sputtering Target Description
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Purity |
Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AlTi 95/5wt%, AlTi 90/10wt% |
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Shape |
Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) |
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Certification |
ISO 9001:2008 |
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Specification |
Customized as request |
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Process |
Forged , Rolling , Grinding |
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Application |
1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical |
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Density |
4.51g/cm3 |
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