Titanium Aluminum Sputtering Target
FANMETAL supply the Ti-Al alloy titanium aluminum sputtering target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc )
The quality requirements of Titanium Aluminum Sputtering Target materials are higher than those of the traditional material industry. General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or Special requirements include: surface roughness, resistance value, uniformity of grain size, uniformity of composition and structure, foreign matter (oxide) content and size, permeability, ultra-high density and ultra-fine grains, etc.
Titanium Aluminum Sputtering Target Picture:
Titanium Aluminum Sputtering Target Description
|
Purity |
Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AlTi 95/5wt%, AlTi 90/10wt% |
|
Shape |
Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) |
|
Certification |
ISO 9001:2008 |
|
Specification |
Customized as request |
|
Process |
Forged , Rolling , Grinding |
|
Application |
1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical |
|
Density |
4.51g/cm3 |
Hot Tags: Titanium Aluminum Sputtering Target, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, Chromium Sputtering Targets, Chromium Target, Zirconium Round Target, Aluminum Silicon Round Target, Zirconium Sputtering Target, Chromium Cr Targets
Send Inquiry
