Titanium Silicon Planar Sputtering Targets

Titanium Silicon Planar Sputtering Targets Description

Titanium silicide is an inorganic compound that is typically produced by utilizing silicide techniques on silicon and polysilicon lines to reduce the sheet resistance of local transistor connections. Titanium Silicon Planar Sputtering Targets are generally produced by advanced HIP technology, which has a series of advantages such as high hardness, low wear, excellent thermal shock resistance, high purity, fine and uniform grain, long service life, high oxidation resistance and high coating quality . Titanium Silicon Planar Sputtering Targets is an excellent material for metal coating. The hardware tools coated by it are very wear-resistant, so that they can work at high cutting speeds, and can even process very hard nickel alloys and titanium materials. Titanium Silicon Planar Sputtering Targets are also very suitable for application in the semiconductor industry, decoration, display, LED and photovoltaic devices, glass coating and other industries.

Titanium Silicon Planar Sputtering Targets Specifications:

Titanium Silicon Planar Sputtering Targets Pictures:

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