Aluminum Silicon (Al/Si) Sputtering Targets

Aluminum Silicon (Al/Si) Sputtering Targets Description

Material selection and processing

We can use powder metallurgy, casting, or hot pressing for production. The internal structure of the target made by powder metallurgy is uniform, which is very suitable for the production of alloy targets. Casting is suitable for large-scale production of high-purity targets. All processes must be surface-treated and fully tested for quality after completion.

Characteristics

High purity, high density, high dimensional accuracy, good processing performance, and high coating quality.

Excellent corrosion resistance, high stability resistance, impact resistance, fatigue resistance, and long service life.

Excellent electrical and thermal conductivity can transmit current at high speed, good heat dissipation effect.

Resistant to nuclear radiation, environmentally friendly and non-toxic, high recycling rate, gand ood economic benefits.

Application

Aluminum Silicon (Al/Si) Sputtering Targets are mainly used in semiconductor manufacturing, optoelectronic display technology, solar cells, magnetic storage media, decorative and wear-resistant coatings, aerospace or medical equipment, etc. They can sputter transparent conductive films, shielding layers, anti-etching coatings, reflective and anti-reflective layers, antioxidant films, magnetic metal films, high-gloss decorative coatings, anti-corrosion coatings, high-temperature resistant coatings, biocompatible films and other metal films or coatings with different properties to meet application requirements.

FANMETAL can provide customers with high-quality Zirconium Targets, Chromium Target, Titanium Aluminium TiAl Target, X-Ray Tube Tungsten Targets, Titanium Ti Sputtering Target and other high-purity targets and alloy targets, and can also provide customized production.

Aluminum Silicon (Al/Si) Sputtering Targets Specifications:

Aluminum Silicon (Al/Si) Sputtering Targets Pictures

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