99.99% Purity Nickel Ni Sputtering Targets

99.99% Purity Nickel Ni Sputtering Targets Description

Material selection and processing

Select high purity nickel as raw material - high temperature melting - die forming - hot and cold rolling - annealing treatment - machining - comprehensive quality inspection.

Characteristics

• High purity and low magazine content contribute to the formation of high-quality metal films.
• Excellent electrical and thermal conductivity, can quickly conduct heat for heat dissipation.
• Good plasticity and machinability, easy to make a variety of shapes and sizes of the target.
• Good oxidation resistance and corrosion resistance, good dimensional stability, long service life.
• It has a good bonding force with a variety of matrix materials to ensure the long-term stability of the film coating.

Application

99.99% Purity Nickel Ni Sputtering Targets are mainly used in the electronics industry, optical field and decorative coating field.

1. It is used for sputtering deposited nickel films as metal interconnect layers and electrodes for semiconductor chips, and for preparing key components of flat panel displays and electronic packaging materials to protect the normal operation of internal components while improving performance.
2. It is used to prepare various optical films, such as anti-reflection film, reflection film, filter film, etc., to be applied in camera lenses, telescopes, microscopes and other optical instruments.
3. It is used to prepare decorative coating, wear-resistant coating and anti-corrosion coating, which can improve the beauty and service life of the product.

99.99% Purity Nickel Ni Sputtering Targets Specifications:

99.99% Purity Nickel Ni Sputtering Targets Pictures

Product Qualification

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