Aluminum Silicon Round Target
Aluminum Silicon Round Target Description
Material selection and processing
We select high-purity aluminum and silicon raw materials according to a specific ratio for vacuum melting, casting, forging and rolling, heat treatment, wire cutting, grinding and polishing, welding backplane and other processing, and we will conduct strict quality inspection before delivery.
Target material purity is the key factor in film quality. Usually the purity of aluminum must reach 99.99% (4n) or above, and the purity of silicon must also be above 99.999% (5n).
Characteristics
- High purity, high density, can withstand longer plasma bombardment, longer service life
- Excellent conductivity, excellent chemical stability, anti-oxidation, corrosion resistance, suitable for various harsh working environments
- Good optical properties, can meet the requirements of different optical devices for specific optical properties
- Good adhesion, can form a stable film layer on various substrates
- By changing the silicon content and preparation process parameters, the hardness, strength, toughness and other mechanical properties of the film can be effectively adjusted.
Application
- Aluminum Silicon Target can be widely used in electronic information, aerospace, optical and optoelectronic industries, mechanical processing, automobile manufacturing, glass coating and other fields.
- Electronic information: The film prepared using Silicon Aluminum Sputtering Target can provide excellent conductive channels for integrated circuits to ensure the efficient operation of electronic equipment. And it can be used to prepare transparent conductive films for solar cells to enhance the photoelectric conversion performance of the battery.
- Optical field: It can be used to manufacture reflective films for optical elements such as optical lenses and lenses to achieve the effect of anti-transmission or reflection of light of specific wavelengths, and improve the imaging quality and optical performance of optical elements.
- Mechanical processing: High-quality aluminum silicon coatings can be sputtered on the surface of tools and molds to improve hardness, wear resistance and service life.
- Al80 Si20 Sputtering Target has a relatively high aluminum content, which is easier to perform processing operations such as cutting, grinding, and polishing. It can be more conveniently made into targets of various shapes and sizes to meet the needs of different equipment and processes. It is particularly suitable for the manufacture of sensor films and transparent conductive films.
Aluminum Silicon Round Target Dimension
|
Grade |
Al80Si20/Al50Si50/Al99Si1 |
|
Purity |
99.95%/99.999% |
|
Diameter |
20-100mm |
|
Thickness |
3-40mm |
|
Density |
2.6-2.7g/cm3 |
|
Surface |
Alkaline cleaning, High Polished |
|
Delivery Time |
7-20 days |
|
Certification |
ISO 9001 |
Aluminum Silicon Round Target Pictures


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