Aluminum Chromium Sputter Target
Chromium Aluminum Sputter Target Features
The increasing demand for alloy sputtering materials reflects the current trend to create multifunctional hard surface coatings in metal processing, aerospace industry and power engineering.The production methods of Chromium Aluminum Sputter Target can adopt processes such as vacuum melting, powder sintering, hot isostatic pressing (HIP), vacuum extrusion, forging, wire cutting, milling and polishing, and follow the ISO9001 quality management system. Aluminum forms a reflective coating that is very thermally conductive, while chrome forms a smooth coating that is very corrosion resistant. Therefore, the coating produced by Chromium Aluminum Sputter Targets can provide excellent protection, compression resistance, wear resistance, and further improve work efficiency and prolong service life for the plated tools. Chromium Aluminum Sputter Targets are very suitable for applications in metal processing, automotive lighting, aerospace, electronic equipment, semiconductor industry, OLED and optical industries, etc.If necessary, welcome to contact us by email.
Chromium Aluminum Sputter Target Specifications:
|
Material |
CrAl (30/70,) |
|
Purity |
99.5% |
|
Technique |
Sintering,Forging,Annealing,Cutting,Vacuum Melting,Machining |
|
Size |
Disk(Dia<650mm, Thickness >1mm) Step Rectangle (Length <1500mm, Width<300mm, Thickness>1mm) Tube (OD:20mm-160mm, Thickness:2-20mm) |
|
Density |
5.6g/cm3 |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Plate,Wafer,Rectangular,Square,Circle,Tube |
|
Deliver time |
15-20 days |
|
Standard |
ASTM,GB |
|
Certification |
ISO9001 |
Chromium Aluminum Sputter Target Pictures:
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