Pure Zirconium Sputtering Target
Pure Zirconium Sputtering Target Features & Application
Zirconium is widely used in the chemical industry where corrosive conditions exist due to its excellent corrosion resistance. Furthermore, due to its superior high temperature properties, coupled with its low neutron absorption, it is often used in the construction of nuclear reactors. When metal zirconium is made into Pure Zirconium Sputtering Target, zirconium sputtering coating can be used to form a layer of metal zirconium film on the target substrate, and it is widely used in decorative coatings, semiconductors, optical coatings and cutting tools. Pure Zirconium Sputtering Targets can provide very good anti-corrosion and high temperature and low temperature coating protection for important components in the chemical industry and aerospace industry, which has surpassed the corrosion resistance of titanium materials to some extent. It should be noted that during the production process, attention should be paid to the removal of impurities and decontamination. The purity of the target is related to its own excellent performance and coating quality.
Pure Zirconium Sputtering Target Specifications:
|
Material |
Zirconium |
|
Purity |
99.2% |
|
Density |
6.53g/cm3 |
|
Technique |
Hot isostatic pressing,Sintering,Vacuum Melting,Forging,Machining |
|
Diameter |
OD:50-300mm |
|
Thickness |
1mm-35mm |
|
Length |
100mm-4000mm |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Plate,Wafer,Rectangle,Square,Circle,Tube |
|
Standard |
ASTM B550,ASTM B551,GB |
|
Deliver time |
About 20 days |
|
Certification |
ISO9001 |
Pure Zirconium Sputtering Target Pictures:


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