Cobalt Chromium Tungsten Target Description

Material selection and processing

Select high-purity cobalt, chromium, and tungsten metal raw materials for precise batching - vacuum high-temperature melting - mold casting - cutting and grinding - surface polishing or grinding - comprehensive quality inspection.

During the deposition process, atoms will arrange and grow according to the surface morphology and crystal structure of the substrate, and finally form a film with certain properties and structure.

Characteristics

High hardness, good wear resistance, high dimensional accuracy and long service life.
Sputtering of coatings with good corrosion resistance and oxidation resistance in different environments.
High melting point, good thermal stability, strong resistance to creep and thermal stress.
Good biocompatibility to ensure the safety and reliability of medical implants.

Application

Cobalt Chromium Tungsten Target is often used in mechanical processing, aerospace, automobile manufacturing, electronic devices, medical machinery, petrochemical and other fields for surface protection of important parts to improve their service life and safety.

Wear-resistant coatings used in mold manufacturing and cutting tools to ensure the precision of molds and the cutting performance of tools, reduce losses, and improve processing efficiency and quality.
It can be used to prepare coatings for aircraft engine parts, such as turbine blades, combustion chambers, etc., to ensure stable operation of engines in harsh environments and ensure flight safety.
It can be used to prepare coatings for equipment such as reactors, pipelines, valves, etc., to improve the corrosion resistance of equipment, reduce the frequency of equipment maintenance and replacement, and ensure the safety and continuity of the production process.
It can be used to sputter protective coatings for medical devices such as artificial joints and surgical implants, which combine well with human tissues, reduce joint wear, and help patients recover.
It can be used for thin film deposition in semiconductor chip manufacturing and coating of optical devices to ensure the stable performance of the conductive and optical properties of the equipment.

Cobalt Chromium Tungsten Target Dimension

Grade	CrCoW
Purity	99.95%
Thickness	3mm-40mm
Diameter	20mm-160mm
Melting point	1857°C
Density	7.2g/cm³
Shape	Planar Disc
Surface	Polishing, Alkali Cleaning
Certification	ISO 9001