AMS4928 Titanium Alloy Wire Description & Application Titanium alloy wire is made of titanium by voltage, forging, rolling and drawing. The commonly used international standard is AMS4928.
FANMETAL supply the Ti6Al7Nb Titanium Bar according to standard ASTM F1295 and ISO 5832 . ASTM F1295 is the standard specification especially for Wrought Titanium-6Aluminum-7Niobium Alloy for
ASTM B348 Titanium Alloy Billet Description & Application Titanium alloy billets produced by FANMETAL meet the ASTM B348 international standard and are titanium products made by extrusion,
FANMETAL supply the ASTM B550 zirconium round rod material Zr 702, 704 , 705 etc which used in chemical equipment, sputtering target in PVD coating. Zirconium has a very low thermal neutron
FANMETAL supply the Zr 702 Zirconium Plate according to Standard: ASTM B551/B551M-12 which can be used in the construction of chemical columns,vessels and reactors, heat exchanger , porous
Polished Zirconium Bar Description Polished Zirconium Bars is a kind of zirconium products, suitable for processing chemicals, producing nuclear energy components, manufacturing zirconium electrode
FANMETAL supply the Zr 702 Zirconium Disc according to Standard: ASTM B551/B551M-12 which can be used in the construction of chemical industry , semiconductor , and sputtering target .
Zirconium is a highly corrosion-resistant metal and is not prone to crevice corrosion, pitting corrosion and stress corrosion. Zirconium exhibits excellent corrosion resistance in most organic and
Zirconium is a rare metal that is easy to form and process, and can be extruded and drawn into zirconium rods or zirconium wires. Zirconium wire basically includes all the excellent properties of
Zirconium Round Bar Description & Application Zirconium Round Bars are mainly made of zirconium materials through forging, hot or cold rolling, welding and annealing and other processing
FANMETAL supply the Ti-Si alloy titanium silicon sputtering target used in PVD coating system. TiSi alloy compostion: 85:15at% 80:20at% 75:25at% . We also provide the metal target and evaporation
FANMETAL supply Pure 99.999% Titanium Sputtering Target. Purity from 99.5% to 99.9999%. At present, for the 4-megabit VLSI, the purity of titanium is required to reach 4N5 (99.995%) ~ 5N (99.999%),
