+8613140018814
Yttrium Aluminum Oxide Sputtering Targets
video
Yttrium Aluminum Oxide Sputtering Targets

Yttrium Aluminum Oxide Sputtering Targets

Yttrium Aluminum Oxide Sputtering Targets are a kind of ceramic target made of yttrium oxide and aluminum oxide through a specific process. They are often used in optical instruments, electronic semiconductors, aerospace, mechanical processing and other fields to prepare thin film coatings with high light transmittance, high conductivity, wear resistance, insulation and other properties. We can also provide titanium aluminum, aluminum silicon, pure chromium, pure zirconium and other alloy targets. If you have any questions about this product's details or delivery time, don't hesitate to get in touch with us at admin@fanmetalloy.com. We look forward to your message.
Send Inquiry
Product Details ofYttrium Aluminum Oxide Sputtering Targets

Yttrium Aluminum Oxide Sputtering Targets Description

Material selection and processing

Preparation of high-purity YAG powder - cold isostatic pressing - vacuum sintering - cutting - grinding and polishing - quality inspection.

During the processing, attention should be paid to purity, impurity content, uniformity of particle size distribution, suitable crystal form and processing accuracy, which will affect the final performance and quality of the target.

Characteristics

The single stable crystal structure is conducive to the formation of a uniform, dense and well-crystalline film on the substrate.

Excellent optical properties, good light transmittance, low light absorption coefficient and low light loss.

High hardness, not easy to deform, strong wear resistance and long service life

Good conductivity and chemical stability, suitable for a variety of different sputtering processes and coating environments.

Application

Yttrium Aluminum Oxide Sputtering Targets can be widely used in optical coating, semiconductor integrated circuits, flat panel display coating, magnetic storage, surface treatment of aerospace parts, machining tool coating, surface modification of medical devices and other fields.

1. It can be used to prepare various optical films such as anti-reflection film and reflective film, which are applied to optical instruments such as optical lenses, telescopes, microscopes, etc. to improve the imaging quality and performance of optical systems.

2. It is used to deposit insulating functional films in integrated circuits, which helps to improve the integration and reliability of chips, ensure the insulation performance between circuits and the accuracy of signal transmission.

3. It can be used to prepare anti-interference films for magneto-optical storage media, which can improve storage density and ensure the speed and stability of data transmission.

4. High-performance films can improve the hardness, wear resistance, corrosion resistance and thermal stability of aircraft engine components, extend the service life of components, and ensure reliability and safety in extreme environments.

 

Yttrium Aluminum Oxide Sputtering Targets Dimension

Grade

Y3Al5O12

Purity

99.9%-99.999%‌

Mohs Hardness

8-8.5

Diameter

60mm-150mm or customized

Thickness

3-6mm+2mm

Density

4.56g/cm3

Shape

Round

Delivery Time

15-20 days

Certification

ISO 9001

Yttrium Aluminum Oxide Sputtering Targets Pictures

YAG Sputtering Targets

Yttrium Aluminum Oxide Sputtering Targets

Hot Tags: yttrium aluminum oxide sputtering targets, suppliers, manufacturers, factory, customized, wholesale, price, quotation, for sale, Pure Molybdenum Rod, Rhodium Bar, Stellite 6K knife, Inconel 718 Forging Block, Medical Titanium, Rhodium Electrode Rod

Send Inquiry

(0/10)

clearall