Yttrium Aluminum Oxide Sputtering Targets
Yttrium Aluminum Oxide Sputtering Targets Description
Material selection and processing
Preparation of high-purity YAG powder - cold isostatic pressing - vacuum sintering - cutting - grinding and polishing - quality inspection.
During the processing, attention should be paid to purity, impurity content, uniformity of particle size distribution, suitable crystal form and processing accuracy, which will affect the final performance and quality of the target.
Characteristics
The single stable crystal structure is conducive to the formation of a uniform, dense and well-crystalline film on the substrate.
Excellent optical properties, good light transmittance, low light absorption coefficient and low light loss.
High hardness, not easy to deform, strong wear resistance and long service life
Good conductivity and chemical stability, suitable for a variety of different sputtering processes and coating environments.
Application
Yttrium Aluminum Oxide Sputtering Targets can be widely used in optical coating, semiconductor integrated circuits, flat panel display coating, magnetic storage, surface treatment of aerospace parts, machining tool coating, surface modification of medical devices and other fields.
1. It can be used to prepare various optical films such as anti-reflection film and reflective film, which are applied to optical instruments such as optical lenses, telescopes, microscopes, etc. to improve the imaging quality and performance of optical systems.
2. It is used to deposit insulating functional films in integrated circuits, which helps to improve the integration and reliability of chips, ensure the insulation performance between circuits and the accuracy of signal transmission.
3. It can be used to prepare anti-interference films for magneto-optical storage media, which can improve storage density and ensure the speed and stability of data transmission.
4. High-performance films can improve the hardness, wear resistance, corrosion resistance and thermal stability of aircraft engine components, extend the service life of components, and ensure reliability and safety in extreme environments.
Yttrium Aluminum Oxide Sputtering Targets Dimension
|
Grade |
Y3Al5O12 |
|
Purity |
99.9%-99.999% |
|
Mohs Hardness |
8-8.5 |
|
Diameter |
60mm-150mm or customized |
|
Thickness |
3-6mm+2mm |
|
Density |
4.56g/cm3 |
|
Shape |
Round |
|
Delivery Time |
15-20 days |
|
Certification |
ISO 9001 |
Yttrium Aluminum Oxide Sputtering Targets Pictures


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