Tungsten Circular Sputtering Targets

Tungsten Circular Sputtering Targets Description

Tungsten, as a commonly used target material, plays a key role in X-ray tubes. The cathode operating temperature is about 2000K. The emitted electrons are accelerated by tens of thousands to hundreds of thousands of volts and then hit the target surface, thereby generating highly penetrating X-rays. Tungsten Circular Sputtering Targets are generally made by vacuum melting and hot pressing, and then rolled, cut and annealed. They can be widely used in X-ray flaw detectors, lighting industry, vacuum coating processing, electronics and electric vacuum industry, oil drilling, metal smelting, aerospace and medical imaging inspection.
Advantages of Tungsten Circular Sputtering Targets:
1 High melting point: The melting point of metal tungsten is as high as 3410°C, which can withstand high-energy electron beam bombardment without melting easily.
2 High density: It can make the X-ray machine produce higher energy output and improve imaging quality.
3 High temperature resistance and good heat dissipation performance: It is not easy to be corroded in high temperature environment, and can quickly dissipate the generated heat to avoid equipment damage caused by overheating.
4Excellent corrosion resistance, creep resistance, and wear resistance
5Less backscatter: Metal tungsten produces less backscatter when X-rays collide, which helps reduce background noise and improve imaging clarity.

Tungsten Circular Sputtering Targets Specifications:

Tungsten Circular Sputtering Targets Pictures：

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