Titanium Aluminum (Ti-Al) Alloy Sputtering Target

Titanium Aluminum (Ti-Al) Alloy Sputter Target Description

The main function of the sputtering target is to deposit a dense film on the workpiece to improve the wear resistance and service life of the workpiece. There are two methods for preparing Titanium Aluminum (Ti-Al) Alloy Sputtering Target: hot isostatic pressing and smelting. The former pursues higher density and strength, while the latter can obtain higher purity, and different manufacturing processes can be selected according to different application scenarios. Titanium Aluminum (Ti-Al) Alloy Sputtering Targets are very suitable for various metallurgical tool coatings, flat panel display coatings (such as watches, mobile phones and computers) and decorative coatings, and are also commonly used in the ion sputtering field and the electronics industry.

Properties of Titanium Aluminum (Ti-Al) Alloy Sputter Targets:

1. Smaller grain size and more uniform microscopic internal structure

2. High quality, high purity, uniform structure, long service life, good corrosion resistance, high thermal conductivity and high cost performance

3. It can help the tool to obtain higher feed rate, better cutting performance, longer service life and higher metal removal rate

4. Can deposit good hardness, high brightness, corrosion resistance, good fade resistance and durable film

Titanium Aluminum (Ti-Al) Alloy Sputter Target Specifications:

Titanium Aluminum (Ti-Al) Alloy Sputter Target Pictures:

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