Nickel Chromium Rotary Sputtering Target

Nickel Chromium Rotary Sputtering Target Description

Nickel Chromium Rotary Sputtering Targets are generally made by smelting and casting, after a three-layer electrolysis process, as well as a series of mechanical processing such as grinding, lathing, rolling and cutting, with a purity ranging from 99.5% to 99.99%. Thin films sputtered by Nickel Chromium Rotary Sputtering Targets have low temperature dependence, high resistivity, high sensitivity coefficient, high electrical and thermal conductivity, excellent oxidation resistance, uniform microstructure, smooth surface without pores and good durability, etc. Compared with other alloy sputtering targets, it has better physical and chemical properties. In the PVD or CVD coating industry, Nickel Chromium Rotary Sputtering Targets and its films are widely used in surface strengthening films such as wear resistance, wear reduction, heat resistance, and corrosion resistance, as well as low-emissivity glass, microelectronics, magnetic recording, semiconductor and Thin film resistors and other high-end technology industries.

Nickel Chromium Rotary Sputtering Target Specifications:

Nickel Chromium Rotary Sputtering Target Pictures:

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