AISi Alloy Sputtering Target
AISi Alloy Sputtering Target Description
Sputtering target is the most important raw material in coating film deposition technology, which has high requirements for size, flatness, smoothness, density and impurity content. The AISi Alloy Sputtering Target provided by our company can be of various types, such as spraying targets, rotatable circular targets or flat rectangular targets, etc., which have good hardness and flatness, superior optical properties, good electrical and thermal conductivity, and high purity. High, wear resistance and durability and other advantages. AISi Alloy Sputtering Targets have a wider scope of application than ordinary metal targets and superior performance. They are widely used in semiconductor integrated circuits, solar photovoltaics, LCD transparent conductive glass, architectural LOW-E glass, flat display and surface coating of workpieces. a wide range of applications.
AISi Alloy Sputtering Target Specifications:
Material | AlSi80-20 |
Technique | Hot Isostatic Pressing,Sintering,Forging,Annealing |
Purity | 99.9%-99.999% |
Type | Planar sputtering target,Rotary sputtering target,Acr cathode. |
Thickness | 40mm |
Length | 10mm-2000mm |
Diameter | 100mm |
Density | 2.7g/cm3 |
Shape | Discs,Plates,Step,Rectangle,Tube |
Surface | Polished,Alkali Cleaning,Grinding,Black Oxide, etc. |
Delivery Time | 15-20 days |
Certification | ISO9001 |
AISi Alloy Sputtering Target Pictures:
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