Name: Customized Iridium Target Suppliers, Manufacturers, Factory - Wholesale Price - FANMETAL
Brand: FANMETAL
SKU: 300017419

Overview

Iridium Target is a sputtering source made of high-purity iridium metal, the core of which is used for physical vapor deposition (PVD) to prepare high-temperature, corrosion-resistant, and highly stable precious metal films for applications in semiconductors, aerospace, catalytic processing, optical instruments, and other fields. FANMETAL has more than 20 years of professional experience in the export and production of precious metal targets. If you want to know the detailed price, please contact us by email now.

iridium Features

Ultra-high purity

The purity can reach 99.99%-99.999% (4N-5N grade), and the total amount of impurities is controlled below 10ppm to ensure the stability of current transmission and film uniformity, and avoid film layer defects caused by impurities.

High temperature stability

It has a low coefficient of thermal expansion, maintains structural integrity in extreme temperature environments, maintains low thermal resistance at high temperatures, effectively preventing heat accumulation and loss.

corrosion resistance

Iridium resists almost all acids, aqua regia, molten metals, and silicates. A dense oxide film forms on the surface, effectively isolating the external corrosive medium and protecting the substrate from erosion.

Mechanical properties

High density, high tensile strength, Vickers hardness ≥ 1670HV, still maintaining high hardness at 2000°C high temperature. And it can be used for a long time without causing pollution to the environment.

Iridium target Pictures

Iridium Sputter Target Application

1. Semiconductor and chip manufacturing

The Iridium Sputtering Target is used to create ultra-thin barrier layers that limit the movement of copper ions into silicon substrates during fabrication of semiconductors and chips; will allow for greater reliability in chip interconnects; and can be sputtered with a thickness of 0.5-3nm to satisfy the needs of high-density integrated circuits with fine structures, thus enhancing the performance of the devices.

2. Electronic components and display technology

The manufacture of flexible OLED displays to create electrode layers, fabricating micro relay and switch contact materials, the production of sensitive components for high-precision pressure and temperature sensors, and the primary electrode materials used in 5G RF devices are some of the applications. Iridium targets can significantly improve the effectiveness of transmitting signals by enhancing the efficiency of the signal and the accuracy of the measurements.

3. Optical instruments

Due to its reflective properties, iridium is an excellent candidate for mid- and far-infrared reflection/reflection coatings on infrared detectors, infrared optics (lenses), and thermal imaging products. In addition, due to its very smooth surface, iridium coatings can provide additional surface protection for high-end optical systems exposed to harsh environmental conditions in order to enhance the lifetime of the lenses.

4. Aerospace

Infrared remote sensing and infrared imaging devices of satellites and space probes rely on iridium membranes to achieve high infrared reflection and space environment stability. Iridium has a high melting point and excellent oxidation resistance at high temperatures, and can be used as a protective or functional film for high-temperature components and engine-related devices.

5. Energy and catalysis

Iridium serves as a catalyst in membrane electrode assemblies (MEAs) used in hydrogen fuel cells. The catalytic activity and chemical stability of Iridium enhance the efficiency of electrolysis to generate hydrogen and reduce the total energy consumed. When used as an anode material, Iridium provides a significantly longer active service life in chlor-alkali applications when compared to other materials.

Processing

(1) Raw material preparation: Select more than 99.99% high-purity iridium powder for screening and impurity removal to ensure uniform powder purity and particle size.
(2) Cold pressing molding: Iridium powder is loaded into a mold and cold pressed under high pressure to make a porous green blank with a certain strength.
(3) Pre-sintering: heating at low temperature in a vacuum or protective atmosphere to remove the gas inside the body and preliminarily consolidate.
(4) Hot pressing/hot isostatic pressing: the body is densified under high temperature and pressure to obtain high-density, low-porosity iridium billets.
(5) Heat processing treatment: through forging, rolling, or heat treatment, refining the grains, improving the uniformity of the structure, and reducing internal stress.
(6) Precision machining: wire cutting, grinding, and polishing are processed into target blanks that meet the requirements of size, flatness,s and roughness.
(7) Backplate welding (optional): bind the target material to the backplate of copper, molybdenum, and other backplates to ensure good electrical and thermal conductivity during sputtering.
(8) Cleaning and testing packaging: ultrasonic cleaning to remove oil and dust, after passing the purity, density, non-destructive testing, and other tests, clean the vacuum packaging.

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company profile

FANMETAL

XINXIANG FANMETAL TECH CO LTD is mainly engaged in the production and sales of tungsten alloy, molybdenum alloy, cemented carbide, sputtering target, titanium alloy, zirconium metal, Iridium, and Stellite. FANMETAL's main production, technical, and sales employees have 10-30 years of experience, with skillful mechanical processing, surface treatment, as well as finished products sales and customer service solutions. It can help customers solve various problems encountered during production and is used to improve efficiency.

Quality Assurance & Compliance

We can achieve the highest purity required by our customers and can provide ISO 9001 certification, Certificate of Origin, and MTC reports.

Advanced Equipment

We are equipped with the latest sintering equipment, CNC machining center, and inspection and analysis equipment. And the technicians also have more than 20 years of professional experience.

Competitive Prices

Compared with other European and American suppliers, we are able to provide high-quality products while reducing customer budgets. And the freight is also very cost-effective.

Custom Service

We can customize production according to the customer's drawings, and we can also design and process according to the customer's requirements.

FAQ

Q: What is the highest purity of your iridium sputtering targets? How can you prove it?

A: The highest purity of our iridium (Ir) sputtering targets is 99.999% (5N). We provide a certificate of analysis (COA) from third-party laboratories, including test results from GDMS (Glow Discharge Mass Spectrometry) and ICP testing, to verify impurity content and guarantee material purity.

Q: How does grain size affect sputtering performance? How do you control grain size in your process?

A: Uniform and fine-grain size ensures a stable deposition rate, consistent film thickness, low particle generation, and uniform film density during sputtering.
We precisely control grain size through optimized powder pretreatment, vacuum hot pressing / HIP sintering, and post-sintering heat treatment, achieving fine, uniform, and low-defect microstructure to ensure high-quality thin films.

Q: What shapes and dimensions are available for your iridium targets?

A: We can customize iridium sputtering targets into various shapes, including round, planar rectangular, rotary, circular ring, step-shaped targets, and custom special profiles.
Dimensions are customizable according to customer drawings, covering standard and non-standard sizes from small laboratory targets to large-scale industrial coating targets.

Q: How to improve the utilization rate of iridium targets during sputtering?

A: To increase target utilization, we recommend:

Using rotary cylindrical iridium targets instead of planar targets, which can significantly improve utilization.
Adopting high-density, uniform microstructure targets to reduce abnormal erosion and particles.
Optimizing magnetron magnetic field design and sputtering process parameters to achieve more uniform erosion.
We also provide high-uniformity iridium targets to support higher utilization in actual production.

Q: What is your shipping cost?

A: This mainly depends on the weight, volume, the distance from the destination, and the size of the package. We will try our best to communicate with the express company to help you get the most reasonable shipping cost.

Q: What's your delivery time?

A: Our shipping method is mainly by air or sea. After the product is finished, we will use wood, plastic, or carton boxes for tight packaging, and also put some soft materials to prevent product damage. We will deliver it to you as soon as possible, within 20-30 days.