Aluminum Chromium Sputtering Target
Aluminum Chromium Sputtering Target Description
Aluminum, one of the most common metals in the world, is lightweight, malleable and non-magnetic. Chromium is a silver-white metal with excellent corrosion resistance. It can be plated on the metal to prevent rust and wear. Aluminum Chromium Sputtering Target mainly adopts powder metallurgy and hot isostatic pressing process. It is made after wire cutting and machining, which can provide harder and more oxidation-resistant steel for drills, knives, indexable cutting inserts and other tools. Nitride coating. Coatings sputtered from the Aluminum Chromium Sputtering Target have high hot hardness and high oxidation resistance, which can enable tools to achieve faster feed rates, improved cutting performance and higher chip volume. Aluminum Chromium Sputtering Targets are widely used in glass coating, decorative coating, flat panel display, solar cell, optical communication, optical storage and semiconductor industries, etc.
Aluminum Chromium Sputtering Target Specifications:
|
Material |
CrAl (30/70,50/50or Custom-Made) |
|
Purity |
99.7% |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Diameter |
<400mm |
|
Thickness |
1-100mm |
|
Size |
Rectangle (Length 1800mm, Width 400mm Thickness>1mm) Tube ( Rotory Target, OD:20mm-160mm, Thickness:2-20mm) |
|
Density |
5.5g/cm3 |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Plate,Wafer,Rectangular,Square,Circle,Tube |
|
Deliver time |
15-20 days |
|
Standard |
ASTM,GB |
|
Certification |
ISO9001 |
Aluminum Chromium Sputtering Target Pictures:
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