Titanium Silicon Sputter Targets

Titanium Silicon Sputter Targets Description

Magnetron sputtering coating is a new type of physical vapor coating method, which uses an electron gun system to emit and focus electrons on the material to be coated, so that the sputtered atoms follow the principle of momentum conversion, so that the material has higher mechanical properties. The material to be plated is called a sputtering target, which mainly includes metals, alloys and ceramic compounds. Titanium Silicon Sputter Target can be divided into planar target, arc target, cylindrical target and tubular target. It is often manufactured by powder metallurgy process and has excellent physical and chemical properties. Titanium Silicon sputter targets are the perfect combination of nitride hard material layers, silicon guarantees high oxidation resistance and titanium provides exceptional hardness and wear resistance. Titanium Silicon Sputter Targets are widely used in thin film deposition, glass industry, vacuum coating, semiconductor industry, electronics industry, magnetron sputtering technology and decorative coating industry.

Titanium Silicon Sputter Targets Specifications:

Titanium Silicon Sputter Targets Pictures:

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