Titanium Zirconium Alloy Sputtering Target
Titanium Zirconium Alloy Sputtering Target Description
The sputtering target process guarantees excellent corrosion resistance even under very harsh environmental conditions such as corrosive vapors and humidity, and produces thin films that meet precise and demanding application requirements, and also have strong adhesion and strong High light transmittance. Titanium has a very high strength to weight ratio and zirconium has excellent corrosion resistance. So Titanium Zirconium Alloy Sputtering Target includes their excellent properties, which have the advantages of uniform structure, good surface quality, precise size, better film forming performance, long service life and low maintenance cost. Titanium Zirconium Alloy Sputtering Targets are widely used in multi-arc ion vacuum coating or magnetron sputtering PVD in industry, and can be used as wear-resistant materials, decorative coatings or functional coatings according to requirements.
Titanium Zirconium Alloy Sputtering Target Specifications:
|
Material |
Ti10Zr90,Ti15Zr85,Ti30Zr70,etc. |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Diameter |
<400mm |
|
Thickness |
1-100mm |
|
Size |
Rectangle (Length 1800mm, Width 400mm Thickness>1mm) Tube ( Rotory Target, OD:20mm-160mm, Thickness:2-20mm) |
|
Density |
4.7g/cm3 |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Plate,Wafer,Rectangular,Square,Circle,Tube,Step wafer and Customer tailored |
|
Standard |
ASTM B385,GB |
|
Certification |
ISO9001 |
Titanium Zirconium Alloy Sputtering Target Pictures:
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