High Purity Boron Targets
High Purity Boron Targets Features & Application
The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate technological conditions. High purity Purity Boron Targets are a material used for film production. It is produced from boride materials by powder metallurgy process or vacuum arc melting. Boron Targets have excellent properties such as high processability, high thermal stability, high density, good corrosion resistance, high mechanical strength, high coating quality, wear resistance, and long service life. High purity Boron Targets are mainly used to produce various functional films, such as hard coatings, magnetic films, optical films, anti-reflection films, etc., for sputtering in electronic devices, semiconductor chips, solar cells, optical devices and other high-grade decorative supplies
High Purity Boron Targets Specification:
|
Material |
Boron(B) |
|
Technique |
Hot isostatic pressing,Grain refinement,Sintering,Forging,Annealing |
|
Purity |
99-99.99% |
|
Size |
Discs ( Dia ≤480mm,Thickness ≥ 1mm) |
|
Density |
2.34g/cm3 |
|
Surface |
Polished,Alkali Cleaning,Grinding,Black Oxide |
| Delivery Time | 7-10 days |
|
Certification |
ISO9001 |
High Purity Boron Targets Pictures
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