Ruthenium Sputtering Target

Ruthenium (Ru) Sputtering Target Overview

Ruthenium sputtering targets are high-purity ruthenium metal targets used in thin-film deposition processes as source materials for physical vapor deposition (PVD). Ruthenium is a platinum-group metal with excellent electrical conductivity and chemical stability, making it suitable for applications that require precise control over thin-film deposition.

FANMETAL supplies ruthenium targets in disc, plate, rectangular, and custom shapes, with purity and dimensions tailored to your deposition system and application requirements. We also supply other sputtering target materials for different thin-film deposition needs.

Ruthenium Sputter Target Specifications

The data in the specifications table is for reference only. The actual specifications and configurations available may vary depending on the specific requirements of each project.

Applications of Ruthenium Target

Ruthenium sputtering targets are used as source materials for depositing ruthenium thin films in semiconductor, microelectronics, and advanced materials research. These targets support thin-film deposition processes used in the development and fabrication of electronic devices and material structures.

Typical application areas include:

• Semiconductor manufacturing: Ruthenium thin-film deposition for semiconductor research and selected fabrication processes.
• Microelectronics: Deposition of ruthenium films for electronic devices and microelectronic structures.
• Research and development: Laboratory sputtering, thin-film characterization, and the development of new deposition processes.

 

Packaging

 

Ruthenium sputtering targets are vacuum-sealed and carefully packed with foam cushioning to protect the target surface and maintain product cleanliness during storage and transportation. The packaged targets are then placed in cardboard cartons or wooden cases according to the target size, quantity, and shipping requirements.

Ruthenium Target Shapes and Custom Sizes

For custom high-purity ruthenium sputtering targets, customers can provide technical drawings or dimensional specifications to confirm the target size, thickness, and mounting requirements.

If a backing plate is required, confirm its material, dimensions, and bonding requirements before production. For reference, you can also visit our Copper Target Back Plate page to learn more about backing plate configurations. Confirm the backing plate material and bonding method for a ruthenium target based on the specific application and equipment requirements.

Ruthenium Sputtering Target Price

The price of ruthenium sputtering targets depends on the material purity, target dimensions, thickness, order quantity, and processing requirements.
To request a quote from FANMETAL, please provide the required purity, dimensions, thickness, and order quantity. For custom targets, you may also provide technical drawings so that we can confirm the specific specifications before issuing a quote.

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