Gold Sputtering Targets
Gold Sputtering Targets Description & Application
Gold is a dense and soft transition metal with very good ductility and toughness, often forming natural alloys with copper or palladium. Gold Sputtering Targets are made of high-purity gold material after a series of processing, and have the advantages of good heat resistance, strong electrical conductivity, good durability, excellent wear resistance and corrosion resistance, etc. It is a commonly used semiconductor and Optical recording material. The most typical application is to deposit conductive films with high-quality gold sputtering targets on samples that require SEM techniques for inspection. These conductive films can provide good observation of non-conductive samples, improve the contrast of images, and can also protect the samples and reduce radiation damage to the samples. Gold Sputtering Targets can also be used in the display, LED industry, photovoltaic industry, PVD and PLD, communications and aerospace.
Gold Sputtering Targets Specifications:
Material | Gold(Au) |
Purity | 99.99-99.999% |
Size | Φ60mm |
Density | 19.3g/cm3 |
Melting Point | 1064 °C |
Surface | Milling,Grinding,Black,Bright Polished |
Delivery Time | 15-20 days |
Standard | ASTM,GB,ANSI |
Certification | ISO9001 |
Gold Sputtering Targets Pictures:


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