The coating target is a sputtering source that forms various functional films on the substrate by sputtering under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating systems. FANMETAL can provide various metal coating targets such as 99.95% Zirconium Sputter Targets, High Purity Chromium Sputter Targets or 99.5% Boron Sputtering Targets. Welcome to contact us by email.
1. Decoration coating
Decoration coating mainly refers to the surface coating of mobile phones, watches, glasses, sanitary ware, hardware parts and other products. It not only has the effect of beautifying the color, but also has the functions of wear resistance and corrosion resistance. The main types of targets for decorative coating include: chromium (Cr) target, titanium (Ti) target, zirconium (Zr), nickel (Ni), tungsten (W), titanium aluminum (TiAl), stainless steel target, etc.
2. Tool and mold coating
It is mainly used to strengthen the appearance of processing tools, which can significantly improve the service life of molds and the quality of processed parts. According to statistics, the coating proportion of machining tools in developed countries has exceeded 90%. The proportion of tool coating in our country is also constantly increasing, and the demand for target materials for tool coating is expanding day by day. The main types are: TiAl target, chromium aluminum (CrAl) target, Cr target, Ti target, etc.
3. Protective coating
It is mainly applied to the substrate to protect and extend its service life. Protective films include corrosion protective films, lubricating films and thermal protective films. TiC sputtered films and BN sputtered films are often used as high-hardness coatings in cutting and grinding tools.
4. Electrical coating
Sputtering targets can be used to manufacture conductive materials and dielectric films, superconducting films and ITO films in semiconductor devices and integrated circuits.
5.Solar cell coating
Currently, solar cells have been developed for many generations. The first is monocrystalline silicon solar cells, the second generation is amorphous silicon and polycrystalline silicon solar cells, and the third generation is thin film solar cells. The sputtering coating process is to prepare cadmium telluride (CdTe) film, copper indium gallium selenide (CIGS) film and arsenic The most common method for gallium chloride (GaAs) thin films. CIGS sputtering target is a sputtering target represented by solar energy applications. It is composed of four metallic elements, namely copper (Cu), indium (In), gallium (Ga) and selenium (Se). The sputtered CIGS film on the solar cell has the advantages of strong light absorption, good power generation stability, and high conversion efficiency. It can make the solar cell generate electricity for a long time during the day and generate large amounts of electricity. During the coating process, the purity and quality of the CIGS sputtering target will directly affect the quality of the film produced.
