High Purity Zirconium Sputtering Targets

High Purity Zirconium Sputtering Targets Description

High Purity Zirconium Sputtering Targets mainly use zirconium sponge and zirconium crystal rod as raw materials. Although the cost of crystal rod is higher than that of zirconium sponge, it has less impurities and high purity. It is an ideal material for manufacturing sputtering targets. This is because the purity of the material is closely related to the quality of the sputtered film coating. The higher the purity of the material, the longer the adhesion, wear resistance and service life of the coating, and the stronger the protection effect on the product. Compared with titanium targets, High Purity Zirconium Sputtering Targets have higher corrosion resistance, better ductility and non-magnetic properties, and can be cast into various shapes (round, plate or tube). We can supply a range of zirconium metal products with competitive prices and lead times, such as Zirconium Bar,Zirconium Crucible and Zirconium 702 Tube,etc. If necessary, please contact us by email, we will try our best to meet your needs.

High Purity Zirconium Sputtering Targets Specifications:

High Purity Zirconium Sputtering Targets Pictures:

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