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Titanium Boride Sputtering Target

Titanium Boride Sputtering Target

FANMETAL supply the TiB2 Titanium Boride Sputtering Target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc ), Ceramic sputtering targets.
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Product Details ofTitanium Boride Sputtering Target

Titanium Boride Sputtering Target

FANMETAL supply the TiB2 Titanium Boride Sputtering Target used in PVD coating system. We also provide other metals target and evaporation material to high purity 99.9999%, precious metal target (Au , Ag , Pt) , target bonding service , crucible liners ( copper , molybdenum , tungsten etc ), Ceramic sputtering targets.


Description:

Titanium boride (TiB2) is the most stable compound of boron and titanium. It has good electrical conductivity, metallic luster, high hardness and brittleness.powder is gray or gray-black, melting point: 2980°C, density: 4.52 g/cm³n, the oxidation resistance temperature can reach 1000°C in the air, and it is stable in HCl and HF acid.

Titanium Boride (TiB2) is composed of titanium and boron,the most stable and extremely hard ceramic compound,with many advantages including high hardness,stable chemical properties,excellent resistance to oxidation and mechanical corrosion,strong electrical and thermal conductivity,excellent wear resistance and resistance to liquid metal corrosion.At present, titanium Boride is mainly used in the field of wear-resistant coatings and metallurgical and smelting industries (such as cutting tools,high-temperature crucibles, cathode materials,conductive and heating elements).

Application:

Titanium Boride Sputtering Target is mainly used to prepare composite ceramic products; it can also be used for conductive ceramic materials, ceramic cutting tools and molds, etc.; because it can resist the corrosion of molten metal, it can be used for the manufacture of molten metal crucibles and electrolytic cell electrodes.

Titanium Boride Sputtering Target is a boride ceramic sputtering target composed of titanium and boron.Since titanium boride is a ceramic material that needs to be compressed at extremely high temperatures,our company uses high-quality hot presses to produce targets.TiB2 films prepared from Titanium Boride Sputtering Target have good electrical conductivity,low wettability and solubility,so smelting tools coated with them are especially suitable for processing aluminum and other non-ferrous metals.Titanium Boride Sputtering Targets are widely used in thin film deposition,decorative coatings,electronic display,LED,glass coating industry,optical communication and other fields.


Titanium Boride Sputtering Target Picture:


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