Tantalum Metal Disc
Tantalum Metal Disc Description
Tantalum Metal Disc is made of high purity tantalum metal through cold processing, forging, rolling, die casting and stretching processes, with excellent mechanical properties, uniform grain distribution, high strength, high hardness, high temperature resistance, oxidation resistance, super durable and cost-effective advantages. Tantalum Metal Disc is mostly used as a sputtering target, which can be applied to the sputtering deposition coating of optical fibers, semiconductor wafers, integrated circuits, and high vacuum aspirating active materials. Tantalum Metal Disc has an important role in the fields of electronics, metallurgy, steel, automotive, chemical, scientific research, aerospace, superconductivity and atomic energy, such as the manufacture of high-temperature furnace heating elements, high-power tube components, ion sputtering equipment, chemical reaction equipment and electronic components.
Tantalum Metal Disc Specifications:
|
Grade |
Ta1,Ta2,Ta3 |
|
Purity |
Ta≥99.93% |
|
Technique |
Hot rolled,Cold rolled,Cutting,Forming Drilling,Machining,Grinding,Polishing |
|
Diameter |
Φ15mm-400mm |
|
Density |
16.6g/cm3 |
|
Thickness |
3mm-30mm |
|
Melting point |
2996℃ |
|
Surface |
Black,Ground,Alkaline cleaning,Polished,Bright |
|
Standard |
ASTM B708,ASTM B521,GB/T 3628 |
|
Certification |
ISO9001 |
Tantalum Metal Disc Picture:
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