Sputtering target is an important part of running magnetron sputtering technology, which can be divided into three types: metal, alloy and ceramic. Among them, the higher the purity of the material, the higher the quality of the sputtered film and the better the wear resistance, and the protection of the tool is also more lasting. In mid-March, the Indonesian customer has successfully and safely received the Titanium Silicon Sputter Targets we completed and shipped last month, and praised the product quality, delivery speed and service attitude, and plans to further invite us to participate in industry exhibitions. Our company also cherishes good relations with partners, if we can reach cooperation in other non-ferrous metal products, we will work harder to improve production technology to better provide customers with high quality products.
Titanium-silicon Sputtering Targets is made of high quality Titanium Silicon mixed powder pressing, sintering, rolling, annealing, grinding and polishing by powder metallurgy technology. It has high purity, stable structure, high film quality and strong adhesion, strong corrosion resistance, good wear resistance, etc. Excellent impact resistance and strong durability. Titanium Silicon Alloy Sputtering Target can be divided into flat target, circular target, cylindrical target and tubular target, commonly used in PVD or CVD coating systems, ideal for the decorative coating industry, semiconductor device coating, hardware tool coating, automotive glass coating, vacuum coating, etc. Medical industry, LED and photovoltaic devices and other fields.
